Gas supply assembly, components thereof, and reactor system including same

ABSTRACT

Gas supply assemblies and reactors systems including the gas supply assemblies are disclosed. An exemplary gas supply assembly includes a vessel, a valve plate, a housing encasing the vessel and the valve plate, a gas feedthrough having a first end interior of the housing and a second end exterior of the housing, and one or more valves attached to the valve plate, wherein at least one valve is fluidly coupled to an interior of the vessel. The assemblies can further include a removable gas line having a first end coupled to the at least one valve and a second end coupled to the gas feedthrough. Additionally or alternatively, a gas supply assembly can include one or more valve plate leveling devices coupled to the valve plate.

CROSS-REFERENCE TO RELATED APPLICATIONS

This application is a Non-provisional of, and claims priority to and the benefit of, U.S. Provisional Patent Application No. 62/957,647, filed Jan. 6, 2020 and entitled “GAS SUPPLY ASSEMBLY, COMPONENTS THEREOF, AND REACTOR SYSTEM INCLUDING SAME,” which is hereby incorporated by reference herein.

FIELD OF THE DISCLOSURE

The present disclosure generally relates to gas-phase reactor systems and to components thereof. More particularly, examples of the disclosure relate to gas supply assemblies for gas-phase reactor systems, to components of the gas supply assemblies, and to reactor systems including the gas supply assemblies.

BACKGROUND OF THE DISCLOSURE

Gas-phase reactor systems, such as reactor systems that include chemical vapor deposition (CVD), plasma-enhanced CVD (PECVD), atomic layer deposition (ALD), other cyclical deposition, and/or the like reactors can be used for a variety of applications, including depositing and etching materials on a substrate surface. For example, gas-phase reactor systems can be used to deposit and/or etch layers on a substrate to form semiconductor devices, flat panel display devices, photovoltaic devices, microelectromechanical systems (MEMS), and the like.

A typical gas-phase reactor system includes one or more reactors, each reactor including one or more reaction chambers; one or more precursor and/or reactant gas sources fluidly coupled to the reaction chamber(s); one or more carrier and/or purge gas sources fluidly coupled to the reaction chamber(s); one or more gas distribution systems to deliver gasses (e.g., the precursor/reactant gas(es) and/or carrier or purge gas(es)) to a surface of a substrate within a reaction chamber; and at least one exhaust source fluidly coupled to the reaction chamber(s).

Use of precursors, which can be solids or liquids at room temperature and pressure, in gas-phase reactor systems may be desirable, because such precursors may be relatively easy to transport, may be relatively safe to transport, may provide desirable film and/or deposition properties, and/or may be relatively inexpensive to use. Typically, such precursors are stored in vessels that can be coupled to a reactor as part of a reactor system.

Use of precursors that are liquid or solid at room temperature and pressure may require frequent precursor vessel changes, which can affect throughput of the reactor system. Additionally or alternatively, it may be difficult to use precursor vessels of differing sizes. Accordingly, improved reactor systems and gas supply assemblies are desired.

SUMMARY OF THE DISCLOSURE

Various embodiments of the present disclosure relate to gas supply assemblies suitable for use with gas-phase reactors, to reactor systems including one or more of the gas supply assemblies, and to components of the gas supply assemblies. The gas supply assemblies and gas-phase reactor systems can be used to, for example, manufacture electronic devices. While the ways in which various embodiments of the present disclosure address drawbacks of prior assemblies and systems are discussed in more detail below, in general, various embodiments of the disclosure provide improved gas supply assemblies and reactor systems that include a relatively large precursor source vessel, allow for relatively easy removal and/or installation of a precursor source vessel, and/or allow for use of precursor source vessels of varying sizes.

In accordance with at least one embodiment of the disclosure, a gas supply assembly includes a vessel, a valve plate, a housing encasing the vessel and the valve plate, a gas feedthrough having a first end interior of the housing and a second end exterior of the housing, one or more valves attached to the valve plate, wherein at least one valve is fluidly coupled to an interior of the vessel, and a removable gas line having a first end coupled to the at least one valve and a second end coupled to the gas feedthrough. The vessel can retain a precursor that is solid or liquid at normal temperature and pressure (NTP). A size of a vessel can vary according to application. By way of examples, for use with solid precursors, a capacity of the vessel can be greater than 500 g or between about 500 g and about 2 kg or between about 500 g and about 1.75 kg or between about 750 g to about 1.5 kg; a volume for retaining the solid precursor can be between 0.25 L and 1 L. For use with liquid precursors, a capacity of the vessel can be greater than 0.5 L or between about 0.5 L and about 2 L or between about 0.75 L and about 2 L or between about 0.75 L to about 1.5 L. The gas supply assembly can include one or more valve plate leveling devices coupled to (e.g., in contact with) the valve plate. The removable gas line can include one or more sections that are angled (e.g., greater than zero and less than 180 degrees or about 60 to about 120 degrees) with respect to each other. The gas feedthrough can include a casing; the casing can include one or more heaters embedded within the casing. Exemplary gas supply assemblies can include a heater beneath the vessel and one or more heater leveling devices coupled to (e.g., in contact with) the heater.

In accordance with additional embodiments of the disclosure, a gas supply assembly includes a vessel, a valve plate, a housing encasing the vessel and the valve plate, a gas feedthrough having a first end interior of the housing and a second end exterior of the housing, a plurality of valves attached to the valve plate, wherein at least one valve of the plurality of valves is fluidly coupled to an interior of the vessel, and one or more valve plate leveling devices coupled to the valve plate. Gas supply assemblies in accordance with these embodiments can include a removable gas line having a first end coupled to the at least one valve and a second end coupled to the gas feedthrough. The vessel can retain a precursor that is solid or liquid at normal temperature and pressure (NTP). A capacity of a solid precursor vessel can be greater than 500 g or between about 500 g and about 2 kg or between about 500 g and about 1.75 kg or between about 750 g to about 1.5 kg; a volume for retaining the solid precursor can be between 0.25 L and 1 L. A capacity of the liquid precursor vessel can be greater than 0.5 L or between about 0.5 L and about 2 L or between about 0.75 L and about 2 L or between about 0.75 L to about 1.5 L. The removable gas line can include one or more sections that are angled (e.g., greater than zero and less than 180 degrees or about 60 to about 120 degrees) with respect to each other. The gas feedthrough can include a casing; the casing can include one or more heaters embedded within the casing. Exemplary gas supply assemblies can include a heater beneath the vessel, and one or more heater leveling devices coupled to (e.g., in contact with) the heater.

In accordance with yet further exemplary embodiments of the disclosure, a gas-phase reactor system includes one or more gas supply assemblies as described herein.

In accordance with yet further embodiments of the disclosure, an assembly includes a valve plate, one or more valve plate leveling devices coupled to (e.g., in contact with) the valve plate, a base, and a gauge for leveling a valve plate. The gauge can be used to level the valve plate prior to coupling a vessel to the valve plate.

These and other embodiments will become readily apparent to those skilled in the art from the following detailed description of certain embodiments having reference to the attached figures; the invention not being limited to any particular embodiment(s) disclosed.

BRIEF DESCRIPTION OF THE DRAWING FIGURES

A more complete understanding of exemplary embodiments of the present disclosure can be derived by referring to the detailed description and claims when considered in connection with the following illustrative figures.

FIG. 1 illustrates a reactor system in accordance with examples of the disclosure.

FIG. 2 illustrates a gas supply assembly in accordance with at least one embodiment of the disclosure.

FIGS. 3 and 4 illustrate a portion of a gas supply assembly in accordance with at least one embodiment of the disclosure.

FIG. 5 illustrates a removable gas line in accordance with at least one embodiment of the disclosure.

FIGS. 6A and 6B illustrate a solid source vessel in accordance with at least one embodiment of the disclosure.

FIG. 7 illustrates a gas feedthrough in accordance with at least one embodiment of the disclosure.

FIGS. 8 and 9 illustrate leveling devices in accordance with further examples of the disclosure.

FIG. 10 illustrates a gauge in accordance with yet additional embodiments of the disclosure.

FIG. 11 illustrates a gas supply assembly in accordance with at least one other embodiment of the disclosure.

FIG. 12 illustrates a vessel in accordance with further examples of the disclosure.

FIG. 13 illustrates a portion of a gas supply assembly in accordance with at least one other embodiment of the disclosure.

It will be appreciated that elements in the figures are illustrated for simplicity and clarity and have not necessarily been drawn to scale. For example, the dimensions of some of the elements in the figures may be exaggerated relative to other elements to help improve understanding of illustrated embodiments of the present disclosure.

DETAILED DESCRIPTION OF EXEMPLARY EMBODIMENTS

Although certain embodiments and examples are disclosed below, it will be understood by those in the art that the invention extends beyond the specifically disclosed embodiments and/or uses of the invention and obvious modifications and equivalents thereof. Thus, it is intended that the scope of the invention disclosed should not be limited by the particular disclosed embodiments described below.

The present disclosure generally relates to gas supply assemblies, to components of the assemblies, and to reactor systems that include one or more of the gas supply assemblies. The gas supply assemblies and reactor systems as described herein can be used to process substrates, such as semiconductor wafers, to form, for example, electronic devices. By way of examples, the assemblies and reactor systems described herein can be used to form or grow epitaxial layers on a surface of a substrate. However, unless noted otherwise, the reactor systems and gas supply assemblies are not so limited.

Turning now to the figures, FIG. 1 illustrates a reactor system 100 in accordance with examples of the disclosure. Reactor system 100 includes a reaction chamber 102, a gas distribution system 104, a gas supply assembly 106, an exhaust source 108, and a controller 110. In the illustrated example, reactor system 100 also includes a second gas source 112.

Reaction chamber 102 can be or include a reaction chamber suitable for gas-phase reactions. Reaction chamber 102 can be formed of suitable material, such as quartz. Reactor system 100 can include any suitable number of reaction chambers 102 and can optionally include one or more substrate handling systems. By way of example, reaction chamber 102 can include a cross flow, cold wall epitaxial reaction chamber.

Gas distribution system 104 can be configured to provide one or more precursors, one or more reactants, and/or one or more purge and/or carrier gasses to reaction chamber 102. Gas distribution system 104 can be used to meter and control gas flow rates of the one or more precursors, reactants, purge, and/or carrier gasses to reaction chamber 102. For example, gas distribution system 104 can be used to meter gasses from gas supply assembly 106 and/or second gas source 112 to reaction chamber 102, each with or without a carrier gas.

Gas supply assembly 106 can be configured to retain a precursor that is solid or liquid at NTP and to vaporize the solid precursor or liquid precursor for delivery of a gas phase of the precursor to reaction chamber 102. Exemplary gas supply assemblies suitable for gas supply assembly 106 are discussed in more detail below.

Exhaust source 108 can include, for example, one or more vacuum sources. Exemplary vacuum sources include one or more dry vacuum pumps and/or one or more turbomolecular pumps.

Controller 110 can be configured to perform various functions and/or steps as described herein. Controller 110 can include one or more microprocessors, memory elements, and/or switching elements to perform the various functions. Although illustrated as a single unit, controller 110 can alternatively comprise multiple devices. By way of examples, controller 110 can be used to control gas flow (e.g., by monitoring flow rates and controlling valves), motors, control flow of coolant in and/or out of cooling tubes or channels of gas distribution assembly 104, and/or control heaters, such as one or more of the heaters described herein.

Second gas source 112 can include any suitable material. By way of examples, second gas source 112 can include a material that is gas, liquid, or solid at NTP. The material can be used as an etchant, a carrier gas, or as a precursor or reactant in a deposition process.

FIG. 2 illustrates a gas supply assembly 200 suitable for use as gas supply assembly 106. Gas supply assembly 200 includes a vessel 202, a valve plate or pallet 204, a housing 206, a gas feedthrough 208, and valves 210-228. Gas supply assembly 200 also includes a removable gas line 302, illustrated in FIG. 3.

Vessel 202 is illustrated in greater detail in FIG. 6A (top view) and FIG. 6B (side view). In the illustrated example, vessel 202 can retain a solid precursor material. Alternative vessels suitable for use in gas supply assembly 106 that are configured to retain a liquid precursor are illustrated in FIGS. 11 and 12.

Vessel 202 can be formed of any suitable material. By way of examples, vessel 202 can be formed of stainless steel. In other embodiments, vessel 202 or components thereof can be formed of high nickel alloys, aluminum, or titanium. It should be understood that the vessel 202 or components thereof can be formed of any other material sufficient to allow sufficient thermal heat transfer to vaporize the precursor disposed within the source vessel 202 while being inert, or not reacting with the precursor or contents within the vessel 202 to any appreciable extent.

In the illustrated example, vessel 202 includes a base 602 and an interior section 604 having a recessed region 606 formed therein, and a lid 230, which can be removably attached to base 602. Lid 230 can include a plurality of openings fluidly coupled to one or more of valves 214, 222, 226.

Recessed region 606 can be machined directly into base 602. Alternatively, recessed region 606 can be formed within one or more trays that are inserted into base 602. When lid 230 is removably attached to base 602, a seal 608 can be disposed between lid 230 and base 602 to ensure the contents within vessel 202 are secured there within. In an embodiment, the base 602 and the lid 230 are formed of the same material such that both have substantially the same thermal conductivity and the same coefficient of thermal expansion. In another embodiment, base 602 can be formed of a material different than the material used to form the lid 230.

Seal 608 can be or include an O-ring that is disposed within a groove formed in base 602. In another embodiment, seal 608 can be formed as a metal gasket or a V-seal that is configured to be disposed between base 602 and lid 230. Seal 608 can be formed of any shape, size, or configuration sufficient to provide a seal when lid 230 is attached to base 602 and to ensure that the contents within vessel 202 are secured. In an embodiment, seal 608 is formed of an elastomer, but it should be understood by one of ordinary skill in the art that the seal 608 may be formed of any other material sufficient to provide a seal, such as, but not limited to, polymer or metal.

Lid 230 and base 602 can be configured to be mechanically attached to each other using, for example, one or more attachment devices (e.g., bolts, screws, or the like). In certain embodiments, lid 230 and base 602 are mechanically attached in a gas-tight fashion.

Recessed region 606 can include a channel path 610 and one or more pads 612-616, which can include, for example, an inlet recessed pad 616, an outlet recessed pad 612, and a burp recessed pad 614. Recessed pads 612-616 can be generally triangular-shaped recessed regions extending downwardly from a contact surface 618 of the base 602. A shape of recessed pads 612-616 can be substantially the same shape and size of the portion of a corresponding filtration apparatus (not illustrated) that can extend from the lower surface of lid 230 into base 602, such that a portion of each filtration apparatus is received within a corresponding recessed pad 612-616. Recessed pads 612-616 extend downwardly from the contact surface 618 to a predefined depth. In an embodiment, the depth of all of the recessed pads 612-616 is the same. In another embodiment, the depth of at least one of the recessed pads 612-616 is different than the depth of the others. When base 602 is filled with precursor, a volume within each of the recessed pads 612-616 may not be filled with precursor. When a carrier gas is introduced into the base 602 through—e.g., a filtration apparatus, the carrier gas can contact and be distributed within the inlet recessed pad 616 before traveling throughout the remainder of the recessed region 606. Because there is preferably no precursor located within any of the recessed pads 612-616, the introduction of a carrier gas into the inlet recessed pad 616 prevents the carrier gas from directly contacting the precursor and potentially stifling the precursor or causing particles of the precursor to be intermixed with the carrier gas. In the illustrated example, each of the recessed pads 612-616 of the recessed region 606 is fluidly connected by way of the channel 610 formed into body 602.

Channel 610 can extend from the contact surface 608, wherein channel 610 is a continuous pathway along which gasses can travel between inlet recessed pad 616 and outlet recessed pad 612. In another embodiment, the recessed region 610 may not include recessed pads. Channel 610 can be formed into body 602, such that channel 610 has a depth that is greater than the depth of recessed pads 612-616. In an embodiment, a depth of the channel 610 is constant along the entire length of channel 610. In another embodiment, a depth of the channel 610 varies along the length of the channel 610.

When vessel 202 is filled with liquid or solid precursor material (not shown), the precursor material is preferably disposed only within channel 610 of the recessed region 606. Channel 610 can be filled to a depth that is below a bottom surface of recessed pads 612-616 to prevent or mitigate any of the precursor material from being disposed within recessed pads 612-616. Further, a bottom surface of the outlet recessed pad 612 can be located above the upper surface of the precursor material such that any precursor material particles tend to remain within channel 610.

A capacity of vessel 202 (e.g., of channel 610) can vary according to application. In accordance with examples of the disclosure, vessel 202's (e.g., of channel 610) capacity is greater than 500 g or between about 500 g and about 2 kg or between about 500 g and about 1.75 kg or between about 750 g to about 1.5 kg; a volume for retaining the solid precursor can be between 0.25 L and 1 L. A depth of channel 610 can range from, for example, greater than 30 mm, greater than 40 mm, or between about 30 mm and about 120 mm or between about 40 mm and about 80 mm or about 50 mm and about 70 mm.

Valve plate or pallet 204 is configured to retain one or more of valves 210-228. In accordance with examples of the disclosure, valve plate 204 resides above a centerline axis 232 of gas feedthrough 208 to accommodate vessel 202.

Valves 210-228 can include any suitable valves, such as controllable valves. By way of examples, valves 210-228 can be or include solenoid valves.

In accordance with exemplary embodiments of the disclosure, removable gas line 302 allows for relatively easy and configurable installation of vessel 202 within housing 206. With reference to FIGS. 3-5, removable gas line 302 can include a first end 502, a second end 504, and conduit 506 therebetween. First end 502 can be configured to fluidly couple to a first end 304 of gas feedthrough 208. Second end 504 can be configured to couple to one or more valves 210-228, such as to an inlet of valve 210. First end 502 can be sealably coupled to first end 304 using a sealing member, such as an O-ring, a metal gasket, or the like. Second end 504 can similarly be sealed to a valve using a sealing member, such as an O-ring, a metal gasket, or the like. Further, an angle between first end 502 and conduit 506 can be greater than zero and less than 180 degrees or between about 60 to about 120 degrees. Similarly, an angle between second end 504 and conduit 506 can be greater than zero and less than 180 degrees or between about 60 to about 120 degrees.

Conduit 506 spans at least a portion of the distance between first end 502 and second end 504, and is sealably coupled to first end 502 and second end 504. A length of conduit 506 can be selected based on, for example, a size or height of vessel 202 (the depth of the vessel can at least in part determine a capacity of the vessel and a length of conduit 506). Thus, assembly 200 can easily accommodate vessels 202 of different dimensions. In accordance with examples of the disclosure, a height of conduit 506 can range from about 10 mm to about 100, about 25 mm to about 100 mm, about 20 mm to about 80 mm, or about 25 mm to about 50 mm. In the illustrated example, conduit 506 is coupled to second end 504 using a coupler 508 and a second conduit 510, which can also vary in length to accommodate vessels 202 of varying sizes.

Housing 206 can be formed of any suitable material. By way of examples, housing 206 can be formed of stainless steel, titanium, or the like.

Gas feedthrough 208 includes first end 304 that is interior to housing 206 and second end 702, illustrated in FIG. 7, that is exterior to housing 206. In the illustrated example, gas feedthrough 208 includes a coupler 704 to couple gas feedthrough 208 to, e.g., a coupler 236, attached to housing 206. Gas feedthrough 208 also includes a casing 706 that encases a tube 708. Gas feedthrough 208 can also include one or more heaters 710 encased between tube 708 and casing 706.

Gas supply assembly 200 can include a gas line cover 306 to reduce heat loss in removable gas line 302.

Gas supply assembly 200 can also include one or more valve plate leveling devices 802, 902, as illustrated in FIGS. 8 and 9. In some cases, valve plate 204 can be leveled prior to vessel 202 installation using one or more valve plate leveling devices 802, 902.

Valve plate leveling devices 802 can include, for example, a set pin 804 and a bracket 806 to receive set pin 804. Bracket 806 can include a threaded region 810 to threadedly receive set pin 804. Further, an end 812 of bracket 806 can be coupled to valve plate 204. A leveling of valve plate 204 in an X direction can be set using set pin 804. An end 808 of set pin 804 can contact gas feedthrough 208 when a desired leveling is obtained.

Valve plate leveling device 902 can include a set pin 904 and a bracket 906. Bracket 906 can be attached to valve plate 204. Set pin 904 can be threadedly received by a support flange 908 that can be directly or indirectly coupled to housing 206. A leveling of valve plate 204 (e.g., in the X direction) can be adjusted and then set using set pin 904—e.g., by causing an end 910 of set pin 904 to apply a force against bracket 906 to thereby set a position of valve plate 204 in the X direction.

Referring now to FIG. 10, a gauge 1000, for leveling valve plate 204 in a Y direction prior to installing a vessel, is illustrated. In particular, gauge 1000 can be used to align valve plate 204 relative to heater plate 1002. In the illustrated example, gauge 1000 includes a first portion 1004 (e.g., a u-shaped bracket) and a second portion 1006 (e.g., another u-shaped bracket). A bubble leveler 1008 on heater plate 1002 and a bubble leveler 1010 on second portion 1006 can be used for leveling measurements—e.g., using one or more heater leveling devices 1012. By way of example, a leveling of heater plate 1002 can be adjusted until a flat contact between first portion 1004 and heater plate 1002 is established.

FIG. 11 illustrates another gas supply assembly 1100, suitable for use with system 100, in accordance with additional embodiments of the disclosure. Gas supply assembly 1100 is similar to gas supply assembly 200, except gas supply assembly 1100 is configured for storage of a liquid precursor, rather than a solid precursor.

Gas supply assembly 1100 includes a vessel 1102, a valve plate or pallet 1104, a housing 1106, a gas feedthrough 1108, valves 1110-1122, and liquid inlet 1124. Gas supply assembly 200 also include a removable gas line 302, illustrated in FIG. 3.

Vessel 1102 can be formed of any suitable material. By way of examples, vessel 1102 can be formed of, for example, stainless steel, high nickel alloys, aluminum, titanium, or the like. It should be understood that the vessel 1102 or components thereof can be formed of any other material sufficient to allow sufficient thermal heat transfer to vaporize the precursor disposed within the vessel 1102 while being inert, or not reacting with the precursor or contents within the vessel 1102 to any appreciable extent.

In the illustrated example, vessel 1102 includes a base 1202 including an interior section 1204 having a recessed region 1206 formed therein, and a lid 1208, which can be removably attached to base 1202. Lid 1208 can include a plurality of openings fluidly coupled to one or more of valves 1112, 1120.

Recessed region 1206 can be machined directly into base 1202. Additionally or alternatively, recessed region 1206 can be substantially cylindrically shaped. A capacity of the vessel 1202 can be greater than 0.5 L or between about 0.5 L and about 2 L or between about 0.75 L and about 2 L or between about 0.75 L to about 1.5 L.

A seal 1210 can be disposed between lid 1208 and base 1202 to ensure the contents within vessel 1102 are secured there within. In an embodiment, base 1202 and lid 1208 are formed of the same material such that both have substantially the same thermal conductivity and the same coefficient of thermal expansion. In another embodiment, base 1202 can be formed of a material different than the material used to form the lid 1208.

Seal 1210 can be or include an O-ring that is disposed within a groove 1212 formed (e.g., machined) in base 1202. In another embodiment, seal 1210 can be formed as a metal gasket or a V-seal that is configured to be disposed between base 1202 and lid 1208. Seal 1210 can be formed of any shape, size, or configuration sufficient to provide a seal when lid 1208 is attached to base 1202 and to ensure that the contents within vessel 1102 are secured. In an embodiment, seal 1210 is formed of an elastomer, but it should be understood by one of ordinary skill in the art that the seal 1210 may be formed of any other material sufficient to provide a seal, such as, but not limited to, polymer or metal.

Housing 1106, gas feedthrough 1108, and valves 1110-1122 can be the same or similar to housing 206, gas feedthrough 208, and valves 210-228.

Gas supply assembly 1100 can include the same or similar valve plate leveling devices illustrated in connection with gas supply assembly 200. Further, gas supply assembly 200 can include a removable gas line, such as removable gas line 302 coupled between, for example, valve 1110 and gas feedthrough 1108.

Gas supply assembly 1100 can also include a drip pan 1302, illustrated in FIG. 13. Assembly can include a stop 1304 attached to drip pan 1302.

The example embodiments of the disclosure described above do not limit the scope of the invention, since these embodiments are merely examples of the embodiments of the invention. For example, although illustrated with a solid precursor source vessel, some examples may not include a solid source precursor vessel. Any equivalent embodiments are intended to be within the scope of this invention. Indeed, various modifications of the disclosure, in addition to those shown and described herein, such as alternative useful combinations of the elements described, may become apparent to those skilled in the art from the description. Such modifications and embodiments are also intended to fall within the scope of the appended claims. 

What is claimed is:
 1. A gas supply assembly comprising: a vessel; a valve plate; a housing encasing the vessel and the valve plate; a gas feedthrough having a first end interior of the housing and a second end exterior of the housing; one or more valves attached to the valve plate, wherein at least one valve is fluidly coupled to an interior of the vessel; and a removable gas line having a first end coupled to the least one valve and a second end coupled to the gas feedthrough.
 2. The gas supply assembly of claim 1, further comprising a lid between the vessel and the valve plate.
 3. The gas supply assembly of claim 1, wherein the vessel retains a solid precursor.
 4. The gas supply assembly of claim 3, wherein a capacity of the vessel greater than 500 g or between about 500 g and about 2 kg or between about 500 g and about 1.75 kg or between about 750 g to about 1.5 kg.
 5. The gas supply assembly of claim 1, wherein the vessel retains a liquid precursor.
 6. The gas supply assembly of claim 5, wherein a capacity of the vessel is greater than 0.5 L or between about 0.5 L and about 2 L or about 0.75 L and about 2 L or between about 0.75 L to about 1.5 L.
 7. The gas supply assembly of claim 1, further comprising one or more valve plate leveling devices coupled to the valve plate.
 8. The gas supply assembly of claim 7, wherein at least one of the one or more valve plate leveling devices comprises a set pin.
 9. The gas supply assembly of claim 1, further comprising drip pan and a stop attached to the drip pan.
 10. The gas supply assembly of claim 1, wherein the removable gas line comprises a first end and a conduit coupled to the first end.
 11. The gas supply assembly of claim 10, wherein an angle between the first end and the conduit is greater than zero and less than 180 degrees.
 12. The gas supply assembly of claim 10, further comprising a coupler between the first end and a second end.
 13. The gas supply assembly of claim 1, further comprising a gas line cover overlying at least a portion of the removable gas line.
 14. The gas supply assembly of claim 1, wherein the gas feedthrough comprises a casing.
 15. The gas supply assembly of claim 14, wherein the gas feedthrough further comprises a heater embedded in the casing.
 16. A gas supply assembly comprising: a vessel; a valve plate; a housing encasing the vessel and the valve plate; a gas feedthrough having a first end interior of the housing and a second end exterior of the housing; a plurality of valves attached to the valve plate, wherein at least one valve of the plurality of valves is fluidly coupled to an interior of the vessel; and one or more valve plate leveling devices coupled to the valve plate.
 17. The gas supply assembly of claim 16, further comprising a removable gas line having a first end coupled to the at least one valve and a second end coupled to the gas feedthrough.
 18. The gas supply assembly of claim 16, further comprising a heater plate beneath the vessel.
 19. The gas supply assembly of claim 18, further comprising one or more heater leveling devices coupled to the heater.
 20. An assembly comprising: a valve plate; one or more valve plate leveling devices coupled to the valve plate; a base; and a gauge for leveling a valve plate. 